American Elements specializes in producing high purity Iron fluoride sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Iron Fluoride as rods, powder and plates. Other shapes are available by request.

Iron is a Block D, Group 8, Period 4 element. The electronic configuration is [Ar] 3d⁶ 4s². In its elemental form iron's CAS number is 7439-89-6. The iron atom has a radius of 124.1.pm and it's Van der Waals radius is 200.pm. Iron is the most commonly used metal for commercial applications due to its hardness, historical availability and low cost. Once used on its own, it is now alloyed with nickel and other elements to produce steel and other high strength, non-corrosive structural metals. Iron as a metal and as its many compounds has numerous uses. It is a primary colorant in glass and ceramics. It is a catalyst. It is the basis for low grade magnets and because of its magnetic properties is used extensively in memory tape. Recent applications for Iron nanoparticles include in water treatment of carbon tetrachloride in contaminated groundwater, magnetic data storage and resonance imaging (MRI) and in certain alloy and catalyst applications. Iron can also be introduced into processes using iron foil, pellets, rod and wire by thin film Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Organometallic and Chemical Vapor Deposition (MOCVD) for specific applications such as fuel cells and solar energy.